The CeO₂ Based Polishing Material Market occupies a distinctive space in the global abrasives industry, offering crucial benefits in surface refinement due to its rare‑earth composition. Cerium oxide (CeO₂) is prized for its ability to deliver chemical‑mechanical polishing (CMP), making it a go-to choice for sectors where precision and defect control are non-negotiable. Whether it’s semiconductor wafers, optical lenses, or flat glass panels, CeO₂‑based polishing compounds deliver a...